Dr. Marco H. P. Moers
Senior Designer
SPIE Involvement:
Author
Publications (10)

Proceedings Article | 26 March 2007
Proc. SPIE. 6520, Optical Microlithography XX
KEYWORDS: Lithography, Logic, Optical lithography, Lithographic illumination, Imaging systems, Error analysis, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Double patterning technology

Proceedings Article | 12 May 2005
Proc. SPIE. 5754, Optical Microlithography XVIII
KEYWORDS: Lithography, Monochromatic aberrations, Imaging systems, Sensors, Silver, Control systems, Electroluminescence, Photomasks, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 26 June 2003
Proc. SPIE. 5040, Optical Microlithography XVI
KEYWORDS: Lithography, Reticles, Lithographic illumination, Sensors, Scanners, Light scattering, Wavefronts, Control systems, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 30 July 2002
Proc. SPIE. 4691, Optical Microlithography XV
KEYWORDS: Lithography, Monochromatic aberrations, Edge detection, Imaging systems, Image processing, Manufacturing, Wavefronts, Scanning electron microscopy, Zernike polynomials, Photomasks

Proceedings Article | 14 September 2001
Proc. SPIE. 4346, Optical Microlithography XIV
KEYWORDS: Lithography, Monochromatic aberrations, Reticles, Deep ultraviolet, Scanners, Feature extraction, Scanning electron microscopy, Spherical lenses, Semiconducting wafers, Phase shifts

Proceedings Article | 26 July 1999
Proc. SPIE. 3679, Optical Microlithography XII
KEYWORDS: Lithography, Monochromatic aberrations, Reticles, Imaging systems, Distortion, Scanning electron microscopy, Photomasks, Photoresist processing, Semiconducting wafers, Overlay metrology

Showing 5 of 10 publications
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