Marco Perske
Senior Engineer at optiX fab GmbH
SPIE Involvement:
Author
Publications (5)

Proceedings Article | 16 March 2015 Paper
Proc. SPIE. 9422, Extreme Ultraviolet (EUV) Lithography VI
KEYWORDS: Extreme ultraviolet, Reflectivity, Mirrors, Optical filters, Binary data, Carbon dioxide lasers, Diffraction, Infrared radiation, Multilayers, Spherical lenses

Proceedings Article | 1 April 2013 Paper
Proc. SPIE. 8679, Extreme Ultraviolet (EUV) Lithography IV
KEYWORDS: Mirrors, Reflectivity, Multilayers, Extreme ultraviolet, Plasma, Extreme ultraviolet lithography, Optical coatings, Light sources, EUV optics, Tin

Proceedings Article | 23 March 2012 Paper
Proc. SPIE. 8322, Extreme Ultraviolet (EUV) Lithography III
KEYWORDS: Mirrors, Extreme ultraviolet, Coating, Reflectivity, Multilayers, EUV optics, Light sources, Plasma, Extreme ultraviolet lithography, Light scattering

Proceedings Article | 25 September 2008 Paper
Proc. SPIE. 7101, Advances in Optical Thin Films III
KEYWORDS: Multilayers, Reflectivity, Mirrors, Extreme ultraviolet, Extreme ultraviolet lithography, Interfaces, EUV optics, Carbon, Annealing, Thermography

Proceedings Article | 3 September 2008 Paper
Proc. SPIE. 7077, Advances in X-Ray/EUV Optics and Components III
KEYWORDS: Reflectivity, Mirrors, Coating, Extreme ultraviolet, Multilayers, Silicon, Molybdenum, Annealing, Interfaces, Plasma

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