Marco Perske
Senior Engineer at optiX fab GmbH
SPIE Involvement:
Author
Publications (5)

Proceedings Article | 16 March 2015
Proc. SPIE. 9422, Extreme Ultraviolet (EUV) Lithography VI
KEYWORDS: Diffraction, Optical filters, Mirrors, Multilayers, Reflectivity, Carbon dioxide lasers, Infrared radiation, Extreme ultraviolet, Spherical lenses, Binary data

Proceedings Article | 1 April 2013
Proc. SPIE. 8679, Extreme Ultraviolet (EUV) Lithography IV
KEYWORDS: Mirrors, Multilayers, Light sources, Optical coatings, Reflectivity, Extreme ultraviolet, Extreme ultraviolet lithography, EUV optics, Plasma, Tin

Proceedings Article | 23 March 2012
Proc. SPIE. 8322, Extreme Ultraviolet (EUV) Lithography III
KEYWORDS: Mirrors, Multilayers, Light sources, Light scattering, Coating, Reflectivity, Extreme ultraviolet, Extreme ultraviolet lithography, EUV optics, Plasma

Proceedings Article | 25 September 2008
Proc. SPIE. 7101, Advances in Optical Thin Films III
KEYWORDS: Thermography, Carbon, Mirrors, Multilayers, Annealing, Interfaces, Reflectivity, Extreme ultraviolet, Extreme ultraviolet lithography, EUV optics

Proceedings Article | 3 September 2008
Proc. SPIE. 7077, Advances in X-Ray/EUV Optics and Components III
KEYWORDS: Mirrors, Multilayers, Annealing, Interfaces, Silicon, Coating, Reflectivity, Extreme ultraviolet, Molybdenum, Plasma

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