Dr. Marco Polli
Sales Director
SPIE Involvement:
Publications (12)

SPIE Journal Paper | 2 July 2015
Hari Pathangi, Boon Teik Chan, Hareen Bayana, Nadia Vandenbroeck, Dieter Van den Heuvel, Lieve Van Look, Paulina Rincon-Delgadillo, Yi Cao, JiHoon Kim, Guanyang Lin, Doni Parnell, Kathleen Nafus, Ryota Harukawa, Ito Chikashi, Marco Polli, Lucia D’Urzo, Roel Gronheid, Paul Nealey
JM3, Vol. 14, Issue 03, 031204, (July 2015) https://doi.org/10.1117/12.10.1117/1.JMM.14.3.031204
KEYWORDS: Etching, Scanning electron microscopy, Silicon, Inspection, Semiconducting wafers, Diffractive optical elements, Defect inspection, Thin film coatings, Directed self assembly

Proceedings Article | 23 March 2009 Paper
Proceedings Volume 7272, 72720G (2009) https://doi.org/10.1117/12.814182
KEYWORDS: Overlay metrology, Double patterning technology, Semiconducting wafers, Diffraction, Scanners, Calibration, Metrology, Diffraction gratings, Spectroscopy, Polarizers

Proceedings Article | 25 March 2008 Paper
Sara Loi, Alejandro Fasciszewski Zeballos, Umberto Iessi, John Robinson, Pavel Izikson, Antonio Mani, Marco Polli
Proceedings Volume 6922, 69223H (2008) https://doi.org/10.1117/12.772904
KEYWORDS: Semiconducting wafers, Metrology, Data modeling, Neural networks, Scanners, Lithography, 3D modeling, Diffractive optical elements, Finite element methods, Photoresist processing

Proceedings Article | 22 March 2008 Paper
Karen Dabertrand, Mathieu Touchet, Stephanie Kremer, Catherine Chaton, Maxime Gatefait, Enrique Aparicio, Marco Polli, Jean-Claude Royer
Proceedings Volume 6922, 69220W (2008) https://doi.org/10.1117/12.771614
KEYWORDS: Critical dimension metrology, Scatterometry, Optical lithography, Scanning electron microscopy, Etching, Single crystal X-ray diffraction, Semiconducting wafers, Diffractive optical elements, Carbon, Scatter measurement

Proceedings Article | 7 March 2008 Paper
Umberto Iessi, Sara Loi, Antonio Salerno, Pierluigi Rigolli, Elio De Chiara, Catia Turco, Roberto Colombo, Marco Polli, Antonio Mani
Proceedings Volume 6924, 692428 (2008) https://doi.org/10.1117/12.772795
KEYWORDS: Photomasks, Overlay metrology, Semiconducting wafers, Double patterning technology, Etching, Scanners, Metrology, Optical alignment, Lithography, Optical lithography

Showing 5 of 12 publications
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