Dr. Marcus Musselman
at Lam Research Corp.
SPIE Involvement:
Author
Publications (1)

Proceedings Article | 20 March 2019
Proc. SPIE. 10963, Advanced Etch Technology for Nanopatterning VIII
KEYWORDS: Lithography, Metrology, Optical lithography, Etching, Scanners, Process control, Critical dimension metrology, Semiconducting wafers, Overlay metrology, Plasma

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