Marcus Dankelmann
Senior Staff Engineer Lithography at Infineon Technologies Dresden
SPIE Involvement:
Author
Publications (2)

PROCEEDINGS ARTICLE | September 4, 2015
Proc. SPIE. 9661, 31st European Mask and Lithography Conference
KEYWORDS: Oxides, Lithography, Etching, Image processing, Silicon, Plasma enhanced chemical vapor deposition, Wet etching, Head-mounted displays, Semiconducting wafers, Wafer testing

PROCEEDINGS ARTICLE | March 28, 2014
Proc. SPIE. 9054, Advanced Etch Technology for Nanopatterning III
KEYWORDS: Etching, Metals, Chemistry, Oxygen, Photomasks, Critical dimension metrology, Photoresist processing, Semiconducting wafers, Plasma, Tin

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