Mr. Marcus Kaestner
Ph.D Student at Technische Univ Ilmenau
SPIE Involvement:
Author
Publications (13)

PROCEEDINGS ARTICLE | March 19, 2018
Proc. SPIE. 10584, Emerging Patterning Technologies 2018
KEYWORDS: Lithography, Electron beam lithography, Etching, Silicon, Scanning probe lithography, Optical alignment, Reactive ion etching, Nanoelectronics, Cryogenics, Nanolithography

PROCEEDINGS ARTICLE | January 31, 2018
Proc. SPIE. 10456, Nanophotonics Australasia 2017
KEYWORDS: Lithography, Nanostructures, Optical lithography, Etching, Image resolution, Scanning probe lithography, Split ring resonators, Optics manufacturing, Cryogenics, Nanolithography

SPIE Journal Paper | June 10, 2015
JM3 Vol. 14 Issue 03
KEYWORDS: Scanning probe lithography, Optical lithography, Lithography, Optical alignment, Semiconducting wafers, Atomic force microscopy, Electron beam lithography, Inspection, Navigation systems, Electrons

PROCEEDINGS ARTICLE | March 20, 2015
Proc. SPIE. 9425, Advances in Patterning Materials and Processes XXXII
KEYWORDS: Thin films, Lithography, Electron beam lithography, Optical lithography, Etching, Glasses, Crystals, Resistance, Scanning probe lithography, Plasma etching

PROCEEDINGS ARTICLE | March 19, 2015
Proc. SPIE. 9424, Metrology, Inspection, and Process Control for Microlithography XXIX
KEYWORDS: Actuators, Lithography, Metrology, Sensors, Scanners, Silicon, Amplifiers, Atomic force microscopy, 3D metrology, Semiconducting wafers

PROCEEDINGS ARTICLE | March 17, 2015
Proc. SPIE. 9423, Alternative Lithographic Technologies VII
KEYWORDS: Lithography, Electron beam lithography, Optical lithography, Imaging systems, Inspection, Control systems, Scanning probe lithography, Atomic force microscopy, Optical alignment, Semiconducting wafers

Showing 5 of 13 publications
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