Marie-Sophie Costes
at Mentor, a Siemens Business
SPIE Involvement:
Author
Publications (1)

Proceedings Article | 5 November 2005
Proc. SPIE. 5992, 25th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Human-machine interfaces, Optical lithography, Visualization, Interfaces, Finite element methods, Photomasks, Transistors, Optical proximity correction, TCAD, Device simulation

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