Marie-Sophie Costes
at Mentor, a Siemens Business
SPIE Involvement:
Author
Publications (1)

Proceedings Article | 5 November 2005 Paper
Proc. SPIE. 5992, 25th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Interfaces, TCAD, Optical lithography, Transistors, Human-machine interfaces, Finite element methods, Optical proximity correction, Photomasks, Visualization, Device simulation

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