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Marie Jacobsson
Sales Representative at Mycronic AB
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Publications (1)
Proceedings Article | 17 December 2003 Paper
Properties of a 248-nm DUV laser mask pattern generator for the 90-nm and 65-nm technology nodes
Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.519970
KEYWORDS: Spatial light modulators, Deep ultraviolet, Photomasks, Laser applications, Excimer lasers, Electron beams, Optical proximity correction, Coherence imaging, Electronics, Particles
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