Dr. Marie E. Krysak Profile

Dr. Marie E. Krysak

Principal Engineer at Intel Corp

SPIE Involvement:

Conference Program Committee | Author

Publications (17)

Proceedings Article | 5 May 2020 Paper

Modeling photon, electron, and chemical interactions in a model hafnium oxide nanocluster EUV photoresist

Patrick Theofanis, James Blackwell, Marie Krysak, Florian Gstrein

Proceedings Volume 11323, 113230I (2020) https://doi.org/10.1117/12.2552837

KEYWORDS: Photoresist materials, Hafnium, Monte Carlo methods, Scattering, Extreme ultraviolet lithography, Chemical species, Oxygen, Oxides, Carbon, Extreme ultraviolet

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SPIE Journal Paper | 19 September 2017 Open Access

Lithographic Stochastics: Beyond 3σ (erratum)

Robert Bristol, Marie Krysak

JM3, Vol. 16, Issue 03, 039801, (September 2017) https://doi.org/10.1117/12.10.1117/1.JMM.16.3.039801

KEYWORDS: Lithography, Stochastic processes, Microelectromechanical systems, Microopto electromechanical systems

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SPIE Journal Paper | 12 June 2017

Lithographic stochastics: beyond 3σ

Robert Bristol, Marie Krysak

JM3, Vol. 16, Issue 02, 023505, (June 2017) https://doi.org/10.1117/12.10.1117/1.JMM.16.2.023505

KEYWORDS: Lithography, Statistical analysis, Stochastic processes, Photons, Critical dimension metrology, Cadmium, Extreme ultraviolet lithography, Extreme ultraviolet, Quenching (fluorescence), Scanners

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Proceedings Article | 24 March 2017 Presentation + Paper

Lithographic stochastics: Beyond 3sigma

Robert Bristol, Marie Krysak

Proceedings Volume 10143, 101430Z (2017) https://doi.org/10.1117/12.2264046

KEYWORDS: Lithography, Stochastic processes, Photoresist materials, Extreme ultraviolet, Electron beams, Critical dimension metrology, Statistical analysis, Cadmium sulfide, Photons, Extreme ultraviolet lithography, Quenching (fluorescence), Semiconducting wafers

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Proceedings Article | 19 March 2015 Paper

Extending resolution limits of EUV resist materials

Marie Krysak, Michael Leeson, Eungnak Han, James Blackwell, Shane Harlson

Proceedings Volume 9422, 942205 (2015) https://doi.org/10.1117/12.2086276

KEYWORDS: Extreme ultraviolet, Etching, Photoresist materials, Extreme ultraviolet lithography, Scanning electron microscopy, Particles, Nanoparticles, Semiconducting wafers, Photoresist processing, Chemically amplified resists

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Proceedings Article | 17 April 2014 Paper

Investigation of novel inorganic resist materials for EUV lithography

Marie Krysak, James Blackwell, Steve Putna, Michael Leeson, Todd Younkin, Shane Harlson, Kent Frasure, Florian Gstrein

Proceedings Volume 9048, 904805 (2014) https://doi.org/10.1117/12.2046677

KEYWORDS: Extreme ultraviolet lithography, Nanoparticles, Extreme ultraviolet, Optical lithography, Metals, Spectroscopy, FT-IR spectroscopy, Scanning electron microscopy, Ultraviolet radiation, Particles

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Proceedings Article | 1 April 2013 Paper

Oxide nanoparticle EUV resists: toward understanding the mechanism of positive and negative tone patterning

Souvik Chakrabarty, Christine Ouyang, Marie Krysak, Markos Trikeriotis, Kyoungyoung Cho, Emmanuel Giannelis, Christopher Ober

Proceedings Volume 8679, 867906 (2013) https://doi.org/10.1117/12.2011490

KEYWORDS: Nanoparticles, Photoresist materials, Electron beam lithography, Oxides, Spectroscopy, Ions, Extreme ultraviolet lithography, Optical lithography, Carbon, Photoresist developing

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Proceedings Article | 23 March 2012 Paper

Tightly bound ligands for hafnium nanoparticle EUV resists

Brian Cardineau, Marie Krysak, Markos Trikeriotis, Emmanuel Giannelis, Christopher Ober, Kyoungyong Cho, Robert Brainard

Proceedings Volume 8322, 83220V (2012) https://doi.org/10.1117/12.917014

KEYWORDS: Nanoparticles, Hafnium, Solids, Sodium, Lithography, Extreme ultraviolet, Oxides, Crystals, Magnetism, Bioalcohols

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Proceedings Article | 23 March 2012 Paper

A new inorganic EUV resist with high-etch resistance

Markos Trikeriotis, Marie Krysak, Yeon Sook Chung, Christine Ouyang, Brian Cardineau, Robert Brainard, Christopher Ober, Emmanuel Giannelis, Kyoungyong Cho

Proceedings Volume 8322, 83220U (2012) https://doi.org/10.1117/12.916384

KEYWORDS: Photoresist materials, Extreme ultraviolet lithography, Etching, Nanoparticles, Resistance, Extreme ultraviolet, Absorbance, Electron beam lithography, Line edge roughness, Hafnium

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Proceedings Article | 19 March 2012 Paper

Investigation of acid diffusion during laser spike annealing with systematically designed photoacid generators

Marie Krysak, Byungki Jung, Michael Thompson, Christopher Ober

Proceedings Volume 8325, 83250M (2012) https://doi.org/10.1117/12.916318

KEYWORDS: Diffusion, Line edge roughness, Lithography, Semiconducting wafers, Annealing, Electron beam lithography, Chemically amplified resists, Semiconductors, Carbon dioxide lasers, Molecules

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Proceedings Article | 16 April 2011 Paper

Patterning conventional photoresists in environmentally friendly silicone fluids

Christine Ouyang, Jin-Kyun Lee, Marie Krysak, Christopher Ober

Proceedings Volume 7972, 79720O (2011) https://doi.org/10.1117/12.879294

KEYWORDS: Silicon, Photoresist materials, Photoresist developing, Microfluidics, Silicon carbide, Lithography, Polymers, Hydrogen, Optical lithography, Microelectronics

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Proceedings Article | 16 April 2011 Paper

Environmentally friendly natural materials-based photoacid generators for next-generation photolithography

Youngjin Cho, Christine Ouyang, Marie Krysak, Wenjie Sun, Victor Gamez, Reyes Sierra-Alvarez, Christopher Ober

Proceedings Volume 7972, 79722A (2011) https://doi.org/10.1117/12.879816

KEYWORDS: Lithography, Scanning electron microscopy, Electron beam lithography, Photoresist materials, Semiconducting wafers, Nitrogen, Chromatography, Polymers, Optical lithography, Glucose

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Proceedings Article | 16 April 2011 Paper

Development of an inorganic nanoparticle photoresist for EUV, e-beam, and 193nm lithography

Marie Krysak, Markos Trikeriotis, Evan Schwartz, Neal Lafferty, Peng Xie, Bruce Smith, Paul Zimmerman, Warren Montgomery, Emmanuel Giannelis, Christopher Ober

Proceedings Volume 7972, 79721C (2011) https://doi.org/10.1117/12.879385

KEYWORDS: Etching, Nanoparticles, Resistance, Oxides, Photoresist materials, Electron beam lithography, Hafnium, Lithography, Extreme ultraviolet lithography, Refractive index

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Proceedings Article | 16 April 2011 Paper

Solvent development processing of chemically amplified resists: chemistry, physics, and polymer science considerations

Christopher Ober, Christine Ouyang, Jin-Kyun Lee, Marie Krysak

Proceedings Volume 7972, 797205 (2011) https://doi.org/10.1117/12.882959

KEYWORDS: Photoresist developing, Polymers, Photoresist materials, Silicon, Carbon dioxide, Molecules, Line edge roughness, Electron beam lithography, Chemically amplified resists, Glasses

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Proceedings Article | 31 March 2010 Paper

All-dry processible and PAG-attached molecular glasses for improved lithographic performance

Marie Krysak, Tristan Kolb, Christian Neuber, Hans-Werner Schmidt, Christopher Ober

Proceedings Volume 7639, 76392C (2010) https://doi.org/10.1117/12.848385

KEYWORDS: Glasses, Molecules, Magnesium, Polymers, Line edge roughness, Semiconducting wafers, Lithography, Silicon, Photoresist materials, Semiconductors

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Proceedings Article | 26 March 2010 Paper

Development of an inorganic photoresist for DUV, EUV, and electron beam imaging

Markos Trikeriotis, Woo Jin Bae, Evan Schwartz, Marie Krysak, Neal Lafferty, Peng Xie, Bruce Smith, Paul Zimmerman, Christopher Ober, Emmanuel Giannelis

Proceedings Volume 7639, 76390E (2010) https://doi.org/10.1117/12.846672

KEYWORDS: Nanoparticles, Photoresist materials, Electron beam lithography, Etching, Hafnium, Resistance, Oxides, Photoresist developing, Deep ultraviolet, Refractive index

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