Dr. Marie E. Krysak
Research Chemist at Intel Corp
SPIE Involvement:
Author
Publications (16)

SPIE Journal Paper | September 19, 2017
JM3 Vol. 16 Issue 03
KEYWORDS: Lithography, Stochastic processes, Microelectromechanical systems, Microopto electromechanical systems

SPIE Journal Paper | June 12, 2017
JM3 Vol. 16 Issue 02
KEYWORDS: Lithography, Statistical analysis, Stochastic processes, Photons, Critical dimension metrology, Cadmium, Extreme ultraviolet lithography, Extreme ultraviolet, Quenching (fluorescence), Scanners

PROCEEDINGS ARTICLE | March 24, 2017
Proc. SPIE. 10143, Extreme Ultraviolet (EUV) Lithography VIII
KEYWORDS: Lithography, Electron beams, Statistical analysis, Photons, Photoresist materials, Extreme ultraviolet, Cadmium sulfide, Extreme ultraviolet lithography, Critical dimension metrology, Semiconducting wafers, Stochastic processes, Quenching (fluorescence)

PROCEEDINGS ARTICLE | March 19, 2015
Proc. SPIE. 9422, Extreme Ultraviolet (EUV) Lithography VI
KEYWORDS: Nanoparticles, Etching, Particles, Scanning electron microscopy, Photoresist materials, Extreme ultraviolet, Extreme ultraviolet lithography, Photoresist processing, Semiconducting wafers, Chemically amplified resists

PROCEEDINGS ARTICLE | April 17, 2014
Proc. SPIE. 9048, Extreme Ultraviolet (EUV) Lithography V
KEYWORDS: FT-IR spectroscopy, Optical lithography, Nanoparticles, Metals, Spectroscopy, Ultraviolet radiation, Particles, Scanning electron microscopy, Extreme ultraviolet, Extreme ultraviolet lithography

PROCEEDINGS ARTICLE | April 1, 2013
Proc. SPIE. 8679, Extreme Ultraviolet (EUV) Lithography IV
KEYWORDS: Oxides, Carbon, Electron beam lithography, Optical lithography, Nanoparticles, Spectroscopy, Ions, Photoresist materials, Extreme ultraviolet lithography, Photoresist developing

Showing 5 of 16 publications
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