Ms. Marijke Scotuzzi Profile

Marijke Scotuzzi

at ASML Netherlands BV

SPIE Involvement:

Author

Publications (2)

SPIE Journal Paper | 15 July 2015

Pattern transfer into silicon using sub-10 nm masks made by electron beam-induced deposition

Marijke Scotuzzi, Martin Kamerbeek, Andy Goodyear, Mike Cooke, Cornelis Hagen

JM3, Vol. 14, Issue 03, 031206, (July 2015) https://doi.org/10.1117/12.10.1117/1.JMM.14.3.031206

KEYWORDS: Etching, Silicon, Chemistry, Chlorine, Scanning electron microscopy, Photomasks, Fluorine, Photomicroscopy, Electron beams, Plasma

Read Abstract +

Proceedings Article | 19 March 2015 Paper

Pattern transfer into silicon using sub-10 nm masks made by electron beam induced deposition

M. Scotuzzi, M. Kamerbeek, Andy Goodyear, M. Cooke, C. Hagen

Proceedings Volume 9423, 94230I (2015) https://doi.org/10.1117/12.2085763

KEYWORDS: Etching, Silicon, Chemistry, Scanning electron microscopy, Photomasks, Fluorine, Photomicroscopy, Chlorine, Atomic force microscopy, Electron beams

Read Abstract +

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Keywords/Phrases

Search In:

Publication Years