Marijke Scotuzzi
at ASML Netherlands BV
SPIE Involvement:
Author
Publications (2)

SPIE Journal Paper | 15 July 2015
JM3 Vol. 14 Issue 03
KEYWORDS: Etching, Silicon, Chemistry, Chlorine, Scanning electron microscopy, Photomasks, Fluorine, Photomicroscopy, Electron beams, Plasma

Proceedings Article | 19 March 2015 Paper
Proc. SPIE. 9423, Alternative Lithographic Technologies VII
KEYWORDS: Electron beams, Etching, Silicon, Chemistry, Atomic force microscopy, Scanning electron microscopy, Photomasks, Chlorine, Photomicroscopy, Fluorine

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