Dr. Mariusz Niewczas
Sr. Consulting Engineer at D2S Inc
SPIE Involvement:
Publications (14)

SPIE Journal Paper | 6 February 2024
JM3, Vol. 23, Issue 01, 011207, (February 2024) https://doi.org/10.1117/12.10.1117/1.JMM.23.1.011207
KEYWORDS: Vestigial sideband modulation, Semiconducting wafers, Optical proximity correction, SRAF, Critical dimension metrology, Lithography, Printing, Design, Scanning electron microscopy, Photomask technology

SPIE Journal Paper | 24 November 2023
JM3, Vol. 23, Issue 01, 011202, (November 2023) https://doi.org/10.1117/12.10.1117/1.JMM.23.1.011202
KEYWORDS: Semiconducting wafers, Information theory, Extreme ultraviolet, Simulations, Industry, Image resolution, Chip manufacturing, Semiconductors, Lithography, Reticles

Proceedings Article | 1 December 2022 Presentation + Paper
Proceedings Volume 12293, 1229307 (2022) https://doi.org/10.1117/12.2643339
KEYWORDS: Photomasks, Semiconducting wafers, Manufacturing, Information theory, Extreme ultraviolet, Image resolution, Reticles, Optical proximity correction, Linear filtering, Inspection

Proceedings Article | 7 October 2020 Presentation + Paper
Proceedings Volume 11518, 115180W (2020) https://doi.org/10.1117/12.2579729

Proceedings Article | 31 March 2020 Presentation + Paper
Proceedings Volume 11327, 113270K (2020) https://doi.org/10.1117/12.2554867
KEYWORDS: Photomasks, Semiconducting wafers, SRAF, Lithography, Optical proximity correction, Extreme ultraviolet, Critical dimension metrology, Mask making

Showing 5 of 14 publications
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