Dr. Mariusz Niewczas
Sr. Consulting Engineer at D2S Inc
SPIE Involvement:
Publications (11)

Proceedings Article | 7 October 2020 Presentation + Paper
Proc. SPIE. 11518, Photomask Technology 2020

Proceedings Article | 31 March 2020 Presentation + Paper
Proc. SPIE. 11327, Optical Microlithography XXXIII
KEYWORDS: Lithography, Photomasks, Extreme ultraviolet, Optical proximity correction, SRAF, Mask making, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 23 March 2020 Paper
Proc. SPIE. 11328, Design-Process-Technology Co-optimization for Manufacturability XIV
KEYWORDS: Lithography, Manufacturing, Photomasks, Computational lithography, Optical proximity correction, Semiconducting wafers, Design for manufacturability

Proceedings Article | 25 October 2019 Paper
Proc. SPIE. 11148, Photomask Technology 2019
KEYWORDS: Electronics, Data modeling, Image segmentation, Image processing, Manufacturing, Scanning electron microscopy, Neural networks, Photomasks, Computer aided design, Network architectures

Proceedings Article | 21 October 2019 Paper
Proc. SPIE. 11148, Photomask Technology 2019
KEYWORDS: Data modeling, Inspection, Scanning electron microscopy, Gallium nitride, Digital imaging, Neural networks, Photomasks, Semiconductor manufacturing, Computer aided design, Semiconducting wafers

Showing 5 of 11 publications
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