Dr. Mark-Alexander Henn
PostDoc at National Institute of Standards and Technology
SPIE Involvement:
Author
Publications (19)

PROCEEDINGS ARTICLE | March 19, 2018
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Semiconductors, Thin films, Metrology, Chemical species, Dielectrics, Optical testing, Scatterometry, Measurement devices, Scatter measurement, Electromagnetism

PROCEEDINGS ARTICLE | March 19, 2018
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Signal to noise ratio, Finite-difference time-domain method, Defect detection, Ultraviolet radiation, Inspection, Interference (communication), Line edge roughness, Semiconducting wafers, Ultraviolet detectors, Defect inspection

SPIE Journal Paper | October 19, 2017
JM3 Vol. 16 Issue 04
KEYWORDS: 3D modeling, Indium arsenide, Polarization, Data modeling, 3D acquisition, Metrology, 3D metrology, Optical fiber cables, Error analysis, Model-based design

PROCEEDINGS ARTICLE | June 26, 2017
Proc. SPIE. 10330, Modeling Aspects in Optical Metrology VI
KEYWORDS: Semiconductors, Signal to noise ratio, Metrology, Finite-difference time-domain method, Optical lithography, Defect detection, Deep ultraviolet, Polarization, Scattering, Ultraviolet radiation, Light scattering, Inspection, Semiconducting wafers, Defect inspection

PROCEEDINGS ARTICLE | March 30, 2017
Proc. SPIE. 10145, Metrology, Inspection, and Process Control for Microlithography XXXI
KEYWORDS: Signal to noise ratio, Finite-difference time-domain method, Optical spheres, Defect detection, Polarization, Scattering, Silicon, Bridges, Extreme ultraviolet, Defect inspection

PROCEEDINGS ARTICLE | March 30, 2017
Proc. SPIE. 10145, Metrology, Inspection, and Process Control for Microlithography XXXI
KEYWORDS: Metrology, Indium arsenide, 3D acquisition, Data modeling, Polarization, Error analysis, Inspection, 3D modeling, Critical dimension metrology, Model-based design

Showing 5 of 19 publications
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