Dr. Mark-Alexander Henn
PostDoc at National Institute of Standards and Technology
SPIE Involvement:
Author
Publications (21)

Proceedings Article | 21 June 2019
Proc. SPIE. 11057, Modeling Aspects in Optical Metrology VII
KEYWORDS: Silicon, Dielectrics, Metrology, Reflectometry, Anisotropy, Reflectivity, Electrons, Electromagnetism, Data modeling

Proceedings Article | 26 March 2019
Proc. SPIE. 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII
KEYWORDS: Metrology, Defect detection, Machine learning, Data modeling, Scattering, Performance modeling, Convolutional neural networks, Inspection, Semiconducting wafers, Defect inspection

Proceedings Article | 19 March 2018
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Signal to noise ratio, Defect detection, Ultraviolet radiation, Ultraviolet detectors, Inspection, Finite-difference time-domain method, Interference (communication), Defect inspection, Line edge roughness, Semiconducting wafers

Proceedings Article | 19 March 2018
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Metrology, Dielectrics, Chemical species, Optical testing, Measurement devices, Scatterometry, Thin films, Semiconductors, Electromagnetism, Scatter measurement

SPIE Journal Paper | 19 October 2017
JM3 Vol. 16 Issue 04
KEYWORDS: 3D modeling, Indium arsenide, Polarization, Data modeling, 3D acquisition, Metrology, 3D metrology, Optical fiber cables, Error analysis, Model-based design

Proceedings Article | 26 June 2017
Proc. SPIE. 10330, Modeling Aspects in Optical Metrology VI
KEYWORDS: Finite-difference time-domain method, Signal to noise ratio, Defect detection, Optical lithography, Semiconductors, Deep ultraviolet, Light scattering, Scattering, Defect inspection, Semiconducting wafers, Polarization, Ultraviolet radiation, Metrology, Inspection

Showing 5 of 21 publications
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