Dr. Mark-Alexander Henn
PostDoc at National Institute of Standards and Technology
SPIE Involvement:
Author
Publications (22)

Proceedings Article | 24 March 2020 Presentation + Paper
Proc. SPIE. 11325, Metrology, Inspection, and Process Control for Microlithography XXXIV
KEYWORDS: Metrology, Data modeling, Computer simulations, Monte Carlo methods, Machine learning, Critical dimension metrology, Inverse scattering problem, Electromagnetic simulation

Proceedings Article | 21 June 2019 Presentation + Paper
Proc. SPIE. 11057, Modeling Aspects in Optical Metrology VII
KEYWORDS: Metrology, Data modeling, Dielectrics, Electrons, Silicon, Reflectivity, Reflectometry, Electromagnetism, Anisotropy

Proceedings Article | 26 March 2019 Presentation + Paper
Proc. SPIE. 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII
KEYWORDS: Metrology, Defect detection, Convolutional neural networks, Data modeling, Scattering, Inspection, Machine learning, Semiconducting wafers, Performance modeling, Defect inspection

Proceedings Article | 19 March 2018 Presentation
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Signal to noise ratio, Finite-difference time-domain method, Defect detection, Ultraviolet radiation, Inspection, Interference (communication), Line edge roughness, Semiconducting wafers, Ultraviolet detectors, Defect inspection

Proceedings Article | 19 March 2018 Presentation
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Semiconductors, Thin films, Metrology, Chemical species, Dielectrics, Optical testing, Scatterometry, Measurement devices, Scatter measurement, Electromagnetism

Showing 5 of 22 publications
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