Dr. Mark P. Davidson
President/Physicist at Spectel Research Corp
SPIE Involvement:
Author | Instructor
Publications (26)

Proceedings Article | 24 March 2009 Paper
Proc. SPIE. 7272, Metrology, Inspection, and Process Control for Microlithography XXIII
KEYWORDS: Oxides, Microscopes, Metrology, Data modeling, Polarization, Optical properties, Data storage, Reflectivity, 3D metrology, Semiconducting wafers

Proceedings Article | 5 April 2007 Paper
Proc. SPIE. 6518, Metrology, Inspection, and Process Control for Microlithography XXI
KEYWORDS: Mathematical modeling, Wafer-level optics, Optical imaging, Microscopes, Metrology, Imaging systems, Image processing, Chromium, Photomasks, Semiconducting wafers

Proceedings Article | 20 October 2006 Paper
Proc. SPIE. 6349, Photomask Technology 2006
KEYWORDS: Wafer-level optics, Microscopes, Metrology, Quartz, Chromium, Optical testing, Objectives, Image transmission, Photomasks, Semiconducting wafers

Proceedings Article | 10 May 2005 Paper
Proc. SPIE. 5752, Metrology, Inspection, and Process Control for Microlithography XIX
KEYWORDS: Optical imaging, Metrology, Scattering, Microscopy, Scanning electron microscopy, Scatterometry, Optical metrology, Critical dimension metrology, Overlay metrology, Illumination engineering

Proceedings Article | 24 May 2004 Paper
Proc. SPIE. 5375, Metrology, Inspection, and Process Control for Microlithography XVIII
KEYWORDS: Metrology, Cadmium, Silicon, Scanning electron microscopy, Frequency modulation, Process control, Fermium, Critical dimension metrology, Overlay metrology, Diffraction gratings

Showing 5 of 26 publications
Course Instructor
SC106: Physics of Metrology
Metrology in IC manufacturing has become a challenging technical area. A range of technologies including scanning electron microscopes, bright field reflecting and transmitting optical microscopes, electrical resistance measuring instruments and others, addresses linewidth and overlay measurement needs. This course will cover thethe physics of theses measurement technologies. The course demonstrates optical and electron microscope simulation and the results. An undergraduate degree in physics or its equivalent is assumed.
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