Dr. Mark Dineen
at Oxford Instruments Plasma Technology Ltd
SPIE Involvement:
Author
Publications (3)

Proceedings Article | 23 March 2020 Paper
Proc. SPIE. 11329, Advanced Etch Technology for Nanopatterning IX
KEYWORDS: Etching, Argon, Gallium nitride, Field effect transistors, Reactive ion etching, Chlorine, Semiconducting wafers, Plasma

Proceedings Article | 20 February 2007 Paper
Proc. SPIE. 6474, Zinc Oxide Materials and Devices II
KEYWORDS: Etching, Ions, Silicon, Gases, Scanning electron microscopy, Photoresist materials, Plasma etching, Zinc oxide, Plasma systems, Plasma

Proceedings Article | 12 May 2004 Paper
Proc. SPIE. 5280, Materials, Active Devices, and Optical Amplifiers
KEYWORDS: Etching, Dry etching, Electrodes, Ions, Chemistry, Photoresist materials, Photomasks, Semiconducting wafers, Plasma systems, Plasma

SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top