Dr. Mark Eurlings
System Engineer at ASML Netherlands BV
SPIE Involvement:
Author
Publications (10)

Proceedings Article | 16 April 2012
Proc. SPIE. 8352, 28th European Mask and Lithography Conference
KEYWORDS: Photomasks, Semiconducting wafers, Extreme ultraviolet lithography, Imaging systems, Reticles, Extreme ultraviolet, Electroluminescence, Critical dimension metrology, Lithography, Scanning electron microscopy

Proceedings Article | 8 April 2011
Proc. SPIE. 7969, Extreme Ultraviolet (EUV) Lithography II
KEYWORDS: Deep ultraviolet, Extreme ultraviolet, Photomasks, Aluminum, Reflectivity, Extreme ultraviolet lithography, Semiconducting wafers, Plasma, Photoresist materials, Data modeling

Proceedings Article | 27 January 2005
Proc. SPIE. 5645, Advanced Microlithography Technologies
KEYWORDS: Optical proximity correction, Photomasks, Error analysis, Model-based design, Lithography, Calibration, Nanoimprint lithography, Scattering, Fiber optic illuminators, Binary data

Proceedings Article | 20 August 2004
Proc. SPIE. 5446, Photomask and Next-Generation Lithography Mask Technology XI
KEYWORDS: Reticles, Photomasks, Optical proximity correction, Line width roughness, Nanoimprint lithography, Semiconducting wafers, Printing, Stray light, Model-based design, Resolution enhancement technologies

Proceedings Article | 28 May 2004
Proc. SPIE. 5377, Optical Microlithography XVII
KEYWORDS: Line width roughness, Electroluminescence, Scanning electron microscopy, Photomasks, Lithography, Design for manufacturing, Semiconducting wafers, Printing, Spatial frequencies, Optical proximity correction

Showing 5 of 10 publications
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