Dr. Mark A. Gesley
at Spynsite LLC
SPIE Involvement:
Author
Publications (9)

Proceedings Article | 4 March 2019
Proc. SPIE. 10890, Label-free Biomedical Imaging and Sensing (LBIS) 2019
KEYWORDS: Optical filters, Visible radiation, Cancer, Blood, Microscopy, Error analysis, Transform theory, Tolerancing, Binary data, Condition numbers

Proceedings Article | 15 October 2003
Proc. SPIE. 5220, Nanofabrication Technologies
KEYWORDS: Lithography, Electron beam lithography, Electron beams, Modulation, Laser applications, Photomasks, Raster graphics, Mask making, Semiconducting wafers, Prototyping

Proceedings Article | 27 December 2002
Proc. SPIE. 4889, 22nd Annual BACUS Symposium on Photomask Technology
KEYWORDS: Lithography, Electron beam lithography, Optical lithography, Modulation, Calibration, Photomasks, Beam shaping, Optical proximity correction, Raster graphics, Chemically amplified resists

Proceedings Article | 1 August 2002
Proc. SPIE. 4754, Photomask and Next-Generation Lithography Mask Technology IX
KEYWORDS: Lithography, Electron beam lithography, Point spread functions, Optical lithography, Etching, Control systems, Photomasks, Optical proximity correction, Raster graphics, Edge roughness

Proceedings Article | 30 July 2002
Proc. SPIE. 4691, Optical Microlithography XV
KEYWORDS: Lithography, Electron beam lithography, Point spread functions, Image resolution, Printing, Photomasks, Optical proximity correction, Convolution, Raster graphics, Model-based design

Showing 5 of 9 publications
Conference Committee Involvement (3)
Photomask Technology
3 October 2005 | Monterey, California, United States
Photomask and Next-Generation Lithography Mask Technology XI
14 April 2004 | Yokohama, Japan
Photomask and NGL Mask Technology X
16 April 2003 | Yokohama, Japan
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