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Mark Ignatowicz
Engineering Training Coordinator at JSR Micro Inc
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Publications (1)
Proceedings Article | 14 September 2001 Paper
When is bilayer thin-film imaging suitable: comparison with single-layer resists
Scott Halle, Alan Thomas, Michael Armacost, Timothy Dalton, Xiaochun Chen, Scott Bukofsky, Oliver Genz, Zhijian Lu, Shahid Butt, Zheng Chen, Richard Ferguson, Eric Coker, Robert Leidy, Qinghuang Lin, Arpan Mahorowala, Katherina Babich, Karen Petrillo, Marie Angelopoulos, Mark Ignatowicz, Bang Bui
Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435797
KEYWORDS: Etching, Photomasks, Dielectrics, Lithography, Oxides, Thin films, Silicon, Reactive ion etching, Photoresist processing, Scanning electron microscopy
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