Dr. Mark A. Lavin
Research Staff Member at IBM Thomas J Watson Research Ctr
SPIE Involvement:
Author
Publications (6)

Proceedings Article | 12 May 2005 Paper
Proc. SPIE. 5754, Optical Microlithography XVIII
KEYWORDS: Lithography, Spatial frequencies, Manufacturing, Printing, Very large scale integration, Photomasks, Optical proximity correction, SRAF, Resolution enhancement technologies, Algorithms

Proceedings Article | 5 May 2005 Paper
Proc. SPIE. 5756, Design and Process Integration for Microelectronic Manufacturing III
KEYWORDS: Lithography, Optical lithography, Diffusion, Manufacturing, Design for manufacturing, Optical proximity correction, Optimization (mathematics), Yield improvement, Model-based design, Resolution enhancement technologies

Proceedings Article | 3 May 2004 Paper
Proc. SPIE. 5379, Design and Process Integration for Microelectronic Manufacturing II
KEYWORDS: Lithography, Optical lithography, Data modeling, Diffusion, Photomasks, Optical proximity correction, Critical dimension metrology, Performance modeling, Model-based design, Resolution enhancement technologies

Proceedings Article | 30 July 2002 Paper
Proc. SPIE. 4691, Optical Microlithography XV
KEYWORDS: Lithography, Logic, Lithographic illumination, Manufacturing, Printing, Image enhancement, Optical proximity correction, SRAF, Binary data, Model-based design

Proceedings Article | 7 December 1994 Paper
Proc. SPIE. 2322, 14th Annual BACUS Symposium on Photomask Technology and Management
KEYWORDS: Etching, Ions, Manufacturing, Inspection, Photomasks, Optical proximity correction, Computer aided design, Reactive ion etching, Semiconducting wafers, Optics manufacturing

Showing 5 of 6 publications
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