Mark Lawliss
at GLOBALFOUNDRIES Inc
SPIE Involvement:
Author
Publications (37)

Proceedings Article | 10 May 2016
Proc. SPIE. 9984, Photomask Japan 2016: XXIII Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Lithography, Logic, Opacity, Etching, Inspection, Chromium, Attenuators, Photomasks, SRAF, Phase shifts

SPIE Journal Paper | 12 April 2016
JM3 Vol. 15 Issue 02
KEYWORDS: Inspection, Extreme ultraviolet, Photomasks, Semiconducting wafers, Metals, Extreme ultraviolet lithography, Multilayers, Etching, Deep ultraviolet, Scanning electron microscopy

SPIE Journal Paper | 18 March 2016
JM3 Vol. 15 Issue 02
KEYWORDS: Extreme ultraviolet, Photomasks, Semiconducting wafers, Multilayers, Critical dimension metrology, Lithography, Extreme ultraviolet lithography, Microscopes, Scanning electron microscopy, Manufacturing

SPIE Journal Paper | 1 February 2016
JM3 Vol. 15 Issue 02
KEYWORDS: Inspection, Photomasks, Semiconducting wafers, Defect detection, Scanning electron microscopy, Extreme ultraviolet lithography, Wafer inspection, Multilayers, Visibility, Overlay metrology

Proceedings Article | 23 October 2015
Proc. SPIE. 9635, Photomask Technology 2015
KEYWORDS: Lithography, Microscopes, Multilayers, Manufacturing, Reflectivity, Photomasks, Extreme ultraviolet, Critical dimension metrology, Semiconducting wafers, Airborne remote sensing

Proceedings Article | 23 October 2015
Proc. SPIE. 9635, Photomask Technology 2015
KEYWORDS: Multilayers, Deep ultraviolet, Manufacturing, Inspection, Scanning electron microscopy, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, EUV optics

Showing 5 of 37 publications
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