Mark John Maslow
System Engineer at ASML Netherlands BV
SPIE Involvement:
Area of Expertise:
Lithography , EUV , Stochastics , Computational Lithography , EPE
Profile Summary

25+ years of experience in semiconductor manufacturing industry

Current position: Technical director for ASML-imec research/studies program
Publications (38)

Proceedings Article | 29 September 2023 Paper
Proceedings Volume 12915, 1291508 (2023)
KEYWORDS: EUV optics, Line width roughness, Signal intensity, Diffraction, Nanoimprint lithography, Spatial frequencies, Critical dimension metrology, Stochastic processes, Source mask optimization, Image transmission

Proceedings Article | 28 April 2023 Paper
Proceedings Volume 12494, 124940L (2023)
KEYWORDS: Critical dimension metrology, Failure analysis, Random forests, Stochastic processes, Statistical analysis, Scanning electron microscopy

Proceedings Article | 1 November 2022 Paper
Proceedings Volume 12472, 124720H (2022)
KEYWORDS: Critical dimension metrology, Metrology, Semiconducting wafers, Photomasks, Spatial frequencies, Stochastic processes, Scanning electron microscopy, Scanners, Fourier transforms, Finite element methods

SPIE Journal Paper | 30 May 2022
JM3, Vol. 21, Issue 02, 023201, (May 2022)
KEYWORDS: Nanoimprint lithography, Etching, Diffraction, Spatial frequencies, Stochastic processes, Image processing, Critical dimension metrology, Photomasks, Semiconducting wafers, Metrology

Proceedings Article | 25 May 2022 Presentation + Paper
Proceedings Volume 12056, 1205605 (2022)
KEYWORDS: Etching, Optical lithography, Critical dimension metrology, Inspection, Photomasks, Line edge roughness, Atomic layer deposition, Line width roughness, Extreme ultraviolet

Showing 5 of 38 publications
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