Mark E. Mason
Director of Design Data Integration at Texas Instruments Inc
SPIE Involvement:
Conference Program Committee | Conference Chair | Conference Co-Chair | Editor | Author
Area of Expertise:
lithography , design for manufacturing
Websites:
Publications (26)

Proceedings Article | 19 March 2008
Proc. SPIE. 6925, Design for Manufacturability through Design-Process Integration II
KEYWORDS: Lithography, Data modeling, Etching, Silicon, Scanning electron microscopy, Transistors, Optical proximity correction, Critical dimension metrology, Model-based design, Process modeling

Proceedings Article | 4 March 2008
Proc. SPIE. 6925, Design for Manufacturability through Design-Process Integration II
KEYWORDS: Lithography, Reticles, Data modeling, Bridges, Transistors, Optical proximity correction, Semiconducting wafers, Failure analysis, Model-based design, Process modeling

Proceedings Article | 27 March 2007
Proc. SPIE. 6520, Optical Microlithography XX
KEYWORDS: Lithography, Data modeling, Metals, Photomasks, Optical proximity correction, SRAF, Critical dimension metrology, Tolerancing, Performance modeling, Model-based design

Showing 5 of 26 publications
Conference Committee Involvement (19)
Design-Process-Technology Co-optimization for Manufacturability XII
28 February 2018 | San Jose, California, United States
Design-Process-Technology Co-optimization for Manufacturability XI
1 March 2017 | San Jose, California, United States
Design-Process-Technology Co-optimization for Manufacturability X
24 February 2016 | San Jose, California, United States
Design-Process-Technology Co-optimization for Manufacturability IX
25 February 2015 | San Jose, California, United States
Design-Process-Technology Co-optimization for Manufacturability VIII
26 February 2014 | San Jose, California, United States
Showing 5 of 19 published special sections
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