Dr. Mark A. Mueller Profile

Dr. Mark A. Mueller

Vice President

SPIE Involvement:

Author

Publications (9)

Proceedings Article | 20 August 2004 Paper

Comparative study of two negative CAR resists: EN-024M and NEB 31

Ki-Ho Baik, Robert Dean, Homer Lem, Stephen Osborne, Mark Mueller, Damon Cole

Proceedings Volume 5446, (2004) https://doi.org/10.1117/12.557718

KEYWORDS: Coating, Line edge roughness, Scanning electron microscopy, Etching, Photomicroscopy, Lithography, Photomasks, Critical dimension metrology, Optical proximity correction, Raster graphics

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Proceedings Article | 17 December 2003 Paper

Improving global CD uniformity by optimizing post-exposure bake and develop sequences

Stephen Osborne, Mark Mueller, Homer Lem, David Reyland, KiHo Baik

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518479

KEYWORDS: Etching, Platinum, Photoresist processing, Nitrogen, Domes, Photomasks, Critical dimension metrology, Metrology, Coating, Curtains

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Proceedings Article | 28 August 2003 Paper

High-resolution etching of MoSi using electron beam patterned chemically amplified resist

Mark Mueller, Serguei Komarov, Ki-Ho Baik

Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.504195

KEYWORDS: Etching, Quartz, Photomasks, Reactive ion etching, Chemistry, Critical dimension metrology, Electron beam lithography, Scanning electron microscopy, Electron beams, Helium

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Proceedings Article | 28 August 2003 Paper

Comparative study between REAP 200 and FEP171 CAR with 50 kV raster e-beam system for sub-100-nm technology

Ki-Ho Baik, Homer Lem, Robert Dean, Stephen Osborne, Mark Mueller, Frank Abboud

Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.504186

KEYWORDS: Etching, Scanning electron microscopy, Line edge roughness, Photomicroscopy, Raster graphics, Coating, Photomasks, Lithography, Critical dimension metrology, Photoresist processing

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Proceedings Article | 1 August 2002 Paper

Raster scan patterning solution for 100- and 70-nm OPC masks

Frank Abboud, Ki-Ho Baik, Varoujan Chakarian, Damon Cole, Robert Dean, Mark Gesley, Herb Gillman, William Moore, Mark Mueller, Robert Naber, Thomas Newman, Romin Puri, Frederick Raymond, Mario Rougieri

Proceedings Volume 4754, (2002) https://doi.org/10.1117/12.476923

KEYWORDS: Photomasks, Raster graphics, Optical proximity correction, Etching, Control systems, Point spread functions, Optical lithography, Electron beam lithography, Lithography, Edge roughness

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Proceedings Article | 1 August 2002 Paper

Dry etching of chrome for photomasks for 100-nm technology using chemically amplified resist

Mark Mueller, Serguie Komarov, Ki-Ho Baik

Proceedings Volume 4754, (2002) https://doi.org/10.1117/12.476954

KEYWORDS: Etching, Photomasks, Dry etching, Photoresist processing, Critical dimension metrology, Scanning electron microscopy, Cadmium, Optical proximity correction, Chemically amplified resists, Electron beam lithography

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Proceedings Article | 1 July 2002 Paper

REAP (raster e-beam advanced process) using 50-kV raster e-beam system for sub-100-nm node mask technology

Ki-Ho Baik, Robert Dean, Mark Mueller, Maiying Lu, Homer Lem, Stephen Osborne, Frank Abboud

Proceedings Volume 4688, (2002) https://doi.org/10.1117/12.472315

KEYWORDS: Etching, Coating, Line edge roughness, Raster graphics, Image processing, Dry etching, Photoresist processing, Lithography, Critical dimension metrology, Photomasks

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