Dr. Mark Neisser
Global Technical Director at Kempur Microelectronic Materials
SPIE Involvement:
Conference Program Committee | Author
Publications (66)

Proceedings Article | 25 March 2016
Proc. SPIE. 9779, Advances in Patterning Materials and Processes XXXIII
KEYWORDS: Lithography, Polymethylmethacrylate, Phase modulation, Polymers, Luminescence, Photons, Molecules, Electrons, Quantum efficiency, Photodiodes, Photoresist materials, Ionization, Extreme ultraviolet, Extreme ultraviolet lithography, Molecular interactions

Proceedings Article | 21 March 2016
Proc. SPIE. 9779, Advances in Patterning Materials and Processes XXXIII
KEYWORDS: Electron beams, Polymers, Molecules, Mass spectrometry, Photoresist materials, Ionization, Extreme ultraviolet, Extreme ultraviolet lithography, Molecular interactions, Photochemistry, Absorption, Chemically amplified resists

Proceedings Article | 18 March 2016
Proc. SPIE. 9776, Extreme Ultraviolet (EUV) Lithography VII
KEYWORDS: Particles, Photons, Copper, Electrons, Silicon, Monte Carlo methods, Ionization, Extreme ultraviolet, Extreme ultraviolet lithography, Solid modeling

SPIE Journal Paper | 24 December 2015
JM3 Vol. 14 Issue 04
KEYWORDS: Palladium, Platinum, Magnesium, Extreme ultraviolet, Solids, Metals, Lithography, Extreme ultraviolet lithography, Carbon monoxide, Carbonates

SPIE Journal Paper | 9 November 2015
JM3 Vol. 14 Issue 04
KEYWORDS: Tin, Line edge roughness, Photoresist materials, Optical lithography, Extreme ultraviolet lithography, Extreme ultraviolet, Lithography, Edge roughness, Crystals, Optical filters

Showing 5 of 66 publications
Conference Committee Involvement (2)
SPIE Lithography Asia - Korea
13 October 2010 | n/a, Republic of Korea
SPIE Lithography Asia - Taiwan
18 November 2009 | Taipei, Taiwan
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