Mark Notarfrancesco
Process Engineer at Intel Corp
SPIE Involvement:
Author
Publications (1)

PROCEEDINGS ARTICLE | July 26, 1999
Proc. SPIE. 3679, Optical Microlithography XII
KEYWORDS: Reticles, Data modeling, Manufacturing, Distortion, Optical alignment, Algorithm development, Semiconducting wafers, Statistical modeling, Overlay metrology, Process modeling

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