Mark Pereira
Engineering Director at Mentor Graphics (India) Pvt. Ltd.
SPIE Involvement:
Publications (14)

Proceedings Article | 13 October 2020 Presentation + Paper
Proc. SPIE. 11518, Photomask Technology 2020
KEYWORDS: Contamination, Air contamination, Image processing, Inspection, Printing, Wafer inspection, Photomasks, Image classification, Semiconducting wafers, Yield improvement

Proceedings Article | 20 October 2016 Paper
Proc. SPIE. 10032, 32nd European Mask and Lithography Conference
KEYWORDS: Fabrication, Visualization, Databases, Manufacturing, Inspection, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, SRAF, Defect inspection

Proceedings Article | 10 May 2016 Paper
Proc. SPIE. 9984, Photomask Japan 2016: XXIII Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Wafer-level optics, Image processing, Scanners, Inspection, Image resolution, Photomasks, Critical dimension metrology, Semiconducting wafers, Resolution enhancement technologies, Defect inspection

Proceedings Article | 23 October 2015 Paper
Proc. SPIE. 9635, Photomask Technology 2015
KEYWORDS: Optical properties, Image processing, Coating, Inspection, Photomasks, Extreme ultraviolet, Neodymium, Semiconducting wafers, Liquids, Defect inspection

Proceedings Article | 9 July 2015 Paper
Proc. SPIE. 9658, Photomask Japan 2015: Photomask and Next-Generation Lithography Mask Technology XXII
KEYWORDS: Optical lithography, Defect detection, Visualization, Image processing, Particles, Coating, Inspection, Photoresist materials, Photomasks, Photoresist processing

Showing 5 of 14 publications
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