Dr. Mark C. Phillips
Intel Fellow Director of Lithography Hardware Solutions at Intel Corp
SPIE Involvement:
Conference Co-Chair | Editor | Author
Publications (6)

Proceedings Article | 17 October 2019
Proc. SPIE. 11147, International Conference on Extreme Ultraviolet Lithography 2019

Proceedings Article | 18 March 2016
Proc. SPIE. 9776, Extreme Ultraviolet (EUV) Lithography VII
KEYWORDS: Reticles, Optical lithography, Scanners, Inspection, Pellicles, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, Yield improvement

Proceedings Article | 21 March 2006
Proc. SPIE. 6154, Optical Microlithography XIX
KEYWORDS: Monochromatic aberrations, Reticles, Metrology, Optical lithography, Wavefronts, Distortion, Critical dimension metrology, Optimization (mathematics), Semiconducting wafers, Overlay metrology

Proceedings Article | 12 May 2005
Proc. SPIE. 5754, Optical Microlithography XVIII
KEYWORDS: Diffraction, Monochromatic aberrations, Image processing, Wavefronts, Distortion, Photomasks, Critical dimension metrology, Semiconducting wafers, Overlay metrology, Fiber optic illuminators

Proceedings Article | 1 October 1990
Proc. SPIE. 1285, Growth of Semiconductor Structures and High-Tc Thin Films on Semiconductors
KEYWORDS: Semiconductors, Thin films, Indium arsenide, Luminescence, Gallium arsenide, Gallium antimonide, Selenium, Semiconducting wafers, Superlattices, Tellurium

Showing 5 of 6 publications
Proceedings Volume Editor (1)

SPIE Conference Volume | 13 April 2020

Conference Committee Involvement (6)
Optical Lithography XXXIV
21 February 2021 | San Jose, California, United States
Optical Microlithography XXXIII
25 February 2020 | San Jose, California, United States
Optical Microlithography XXXII
26 February 2019 | San Jose, California, United States
Optical Microlithography XXXI
27 February 2018 | San Jose, California, United States
Optical Microlithography XXX
28 February 2017 | San Jose, California, United States
Showing 5 of 6 Conference Committees
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