Dr. Mark C. Phillips
Intel Fellow Director of Lithography Hardware Solutions at Intel Corp
SPIE Involvement:
Fellow status | Senior status | Conference Co-Chair | Conference Program Committee | Author
Publications (5)

Proceedings Article | 18 March 2016
Proc. SPIE. 9776, Extreme Ultraviolet (EUV) Lithography VII
KEYWORDS: Reticles, Optical lithography, Scanners, Inspection, Pellicles, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, Yield improvement

Proceedings Article | 21 March 2006
Proc. SPIE. 6154, Optical Microlithography XIX
KEYWORDS: Monochromatic aberrations, Reticles, Metrology, Optical lithography, Wavefronts, Distortion, Critical dimension metrology, Optimization (mathematics), Semiconducting wafers, Overlay metrology

Proceedings Article | 12 May 2005
Proc. SPIE. 5754, Optical Microlithography XVIII
KEYWORDS: Diffraction, Monochromatic aberrations, Image processing, Wavefronts, Distortion, Photomasks, Critical dimension metrology, Semiconducting wafers, Overlay metrology, Fiber optic illuminators

Proceedings Article | 1 October 1990
Proc. SPIE. 1285, Growth of Semiconductor Structures and High-Tc Thin Films on Semiconductors
KEYWORDS: Semiconductors, Thin films, Luminescence, Excitons, Optical alignment, Selenium, Heterojunctions, Superlattices, Stereolithography, P-type semiconductors

Proceedings Article | 1 October 1990
Proc. SPIE. 1285, Growth of Semiconductor Structures and High-Tc Thin Films on Semiconductors
KEYWORDS: Semiconductors, Thin films, Indium arsenide, Luminescence, Gallium arsenide, Gallium antimonide, Selenium, Semiconducting wafers, Superlattices, Tellurium

Conference Committee Involvement (5)
Optical Microlithography XXXIII
23 February 2020 | San Jose, California, United States
Optical Microlithography XXXII
26 February 2019 | San Jose, California, United States
Optical Microlithography XXXI
27 February 2018 | San Jose, California, United States
Optical Microlithography XXX
28 February 2017 | San Jose, California, United States
Optical Microlithography XXIX
23 February 2016 | San Jose, California, United States
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