Mark J. Shaw
at Kayaku Advanced Materials Inc
SPIE Involvement:
Author
Publications (3)

Proceedings Article | 29 March 2006
Proc. SPIE. 6153, Advances in Resist Technology and Processing XXIII
KEYWORDS: Nanotechnology, Lithography, Photography, Scanning electron microscopy, Photoresist materials, Head, Photosensitive materials, Photoresist processing, Semiconducting wafers, Photoresist developing

Proceedings Article | 15 January 2003
Proc. SPIE. 4979, Micromachining and Microfabrication Process Technology VIII
KEYWORDS: Gold, Etching, Polymers, Metals, Particles, Chemistry, Photomasks, Plasma etching, Plating, Plasma

Proceedings Article | 1 June 1992
Proc. SPIE. 1674, Optical/Laser Microlithography V
KEYWORDS: Wafer-level optics, Lithography, Optical lithography, Printing, Photomasks, Critical dimension metrology, Photomicroscopy, Semiconducting wafers, Submicron lithography, Phase shifts

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