Mark Slezak
Director: Lithography Technology at JSR Micro Inc
SPIE Involvement:
Publications (26)

Proceedings Article | 27 March 2014 Paper
Proceedings Volume 9051, 905118 (2014)
KEYWORDS: Double patterning technology, Line width roughness, Optical lithography, Photoresist processing, Coating, Semiconducting wafers, Etching, Lithography, Photoresist materials, Plasma

Proceedings Article | 19 March 2012 Paper
Proceedings Volume 8325, 83251B (2012)
KEYWORDS: Polymers, Reflectivity, Silicon, Semiconducting wafers, Bottom antireflective coatings, Lithography, Chromophores, Critical dimension metrology, Silicon films, Solids

Proceedings Article | 16 April 2011 Paper
Steven Holmes, Cherry Tang, Sean Burns, Yunpeng Yin, Rex Chen, Chiew-seng Koay, Sumanth Kini, Hideyuki Tomizawa, Shyng-Tsong Chen, Nicolette Fender, Brian Osborn, Lovejeet Singh, Karen Petrillo, Guillaume Landie, Scott Halle, Sen Liu, John Arnold, Terry Spooner, Rao Varanasi, Mark Slezak, Matthew Colburn
Proceedings Volume 7972, 79720G (2011)
KEYWORDS: Photoresist processing, Reactive ion etching, Lithography, Photomasks, Dielectrics, Etching, Scanning electron microscopy, Double patterning technology, Semiconductors, Optical lithography

Proceedings Article | 16 April 2011 Paper
Joyce Lowes, Alice Guerrero, Michael Weigand, Carlton Washburn, Charlyn Stroud, Shalini Sharma, David Torres, Mark Slezak, Gary Dabbagh, Cherry Tang
Proceedings Volume 7972, 797227 (2011)
KEYWORDS: Picosecond phenomena, Photoresist materials, Lithography, Semiconducting wafers, Critical dimension metrology, Photoresist developing, Polymers, Silicon, Reflectivity, Photomasks

Proceedings Article | 30 March 2010 Paper
Stefan Harrer, John Arnold, Dario Goldfarb, Steven Holmes, Rex Chen, Cherry Tang, Mark Slezak, Nicolette Fender, Ronald Della Guardia, Eric Joseph, Sebastian Engelmann, Shyng-Tsong Chen, Dave Horak, Yunpeng Yin, Rao Varanasi, Matthew Colburn
Proceedings Volume 7639, 763919 (2010)
KEYWORDS: Back end of line, Dielectrics, Etching, Lithography, Reactive ion etching, Photoresist materials, Optical lithography, Semiconducting wafers, Copper, Polishing

Showing 5 of 26 publications
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