Mark Slezak
Director: Lithography Technology at JSR Micro Inc
SPIE Involvement:
Author
Publications (26)

Proceedings Article | 27 March 2014
Proc. SPIE. 9051, Advances in Patterning Materials and Processes XXXI
KEYWORDS: Lithography, Optical lithography, Etching, Coating, Photoresist materials, Line width roughness, Double patterning technology, Photoresist processing, Semiconducting wafers, Plasma

Proceedings Article | 19 March 2012
Proc. SPIE. 8325, Advances in Resist Materials and Processing Technology XXIX
KEYWORDS: Lithography, Polymers, Silicon, Reflectivity, Chromophores, Silicon films, Solids, Critical dimension metrology, Semiconducting wafers, Bottom antireflective coatings

Proceedings Article | 16 April 2011
Proc. SPIE. 7972, Advances in Resist Materials and Processing Technology XXVIII
KEYWORDS: Lithography, Polymers, Silicon, Reflectivity, Photoresist materials, Photomasks, Picosecond phenomena, Critical dimension metrology, Semiconducting wafers, Photoresist developing

Proceedings Article | 16 April 2011
Proc. SPIE. 7972, Advances in Resist Materials and Processing Technology XXVIII
KEYWORDS: Semiconductors, Lithography, Optical lithography, Etching, Dielectrics, Scanning electron microscopy, Photomasks, Double patterning technology, Reactive ion etching, Photoresist processing

Proceedings Article | 30 March 2010
Proc. SPIE. 7639, Advances in Resist Materials and Processing Technology XXVII
KEYWORDS: Lithography, Polishing, Optical lithography, Etching, Copper, Dielectrics, Photoresist materials, Reactive ion etching, Semiconducting wafers, Back end of line

Showing 5 of 26 publications
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top