Dr. Mark D. Smith
Research Scientist at KLA-Tencor Corp
SPIE Involvement:
Author | Instructor
Publications (78)

PROCEEDINGS ARTICLE | March 30, 2017
Proc. SPIE. 10145, Metrology, Inspection, and Process Control for Microlithography XXXI
KEYWORDS: Lithography, Metrology, Optical lithography, Modulation, Polarization, Image segmentation, Manufacturing, Critical dimension metrology, Semiconducting wafers, Overlay metrology

PROCEEDINGS ARTICLE | March 28, 2017
Proc. SPIE. 10145, Metrology, Inspection, and Process Control for Microlithography XXXI
KEYWORDS: Lithography, Statistical analysis, Image segmentation, Manufacturing, Scanning electron microscopy, Process control, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Line edge roughness, Semiconducting wafers, Stochastic processes, Overlay metrology

PROCEEDINGS ARTICLE | March 28, 2017
Proc. SPIE. 10145, Metrology, Inspection, and Process Control for Microlithography XXXI
KEYWORDS: Semiconductors, Metrology, Optical lithography, Principal component analysis, Seaborgium, Manufacturing, Inspection, Control systems, Process control, Semiconductor manufacturing, Optical alignment, Semiconducting wafers, Tolerancing, Overlay metrology

PROCEEDINGS ARTICLE | October 3, 2016
Proc. SPIE. 9985, Photomask Technology 2016
KEYWORDS: Code division multiplexing, Lithography, Diffraction, Reticles, Optical lithography, Lithographic illumination, Scanners, Photomasks, Artificial intelligence, Nanoimprint lithography

PROCEEDINGS ARTICLE | March 24, 2016
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Lithography, Metrology, Optical lithography, Lithographic illumination, Scanners, Photomasks, Optical proximity correction, SRAF, Overlay metrology, Personal protective equipment, Resolution enhancement technologies

PROCEEDINGS ARTICLE | March 24, 2016
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Lithography, Metrology, Optical lithography, 3D acquisition, Calibration, Manufacturing, Inspection, Computer simulations, Scanning electron microscopy, Monte Carlo methods, 3D metrology, Critical dimension metrology, Photoresist processing, Stochastic processes

Showing 5 of 78 publications
Course Instructor
SC102: Optical Lithography Modeling
This course presents the theory and applications of optical lithography simulation tools. Using examples, practical applications to typical material and image problems will be discussed.
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