Mark Terry
Team Leader/Photo Unit Process at Texas Instruments Inc
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Publications (11)

PROCEEDINGS ARTICLE | March 13, 2009
Proc. SPIE. 7275, Design for Manufacturability through Design-Process Integration III
KEYWORDS: Lithography, Logic, Statistical analysis, Capacitors, Data modeling, Computer simulations, Design for manufacturing, Transistors, Optical proximity correction, Convolution

PROCEEDINGS ARTICLE | March 19, 2008
Proc. SPIE. 6925, Design for Manufacturability through Design-Process Integration II
KEYWORDS: Lithography, Data modeling, Etching, Silicon, Scanning electron microscopy, Transistors, Optical proximity correction, Critical dimension metrology, Model-based design, Process modeling

PROCEEDINGS ARTICLE | March 27, 2007
Proc. SPIE. 6520, Optical Microlithography XX
KEYWORDS: Lithography, Data modeling, Metals, Photomasks, Optical proximity correction, SRAF, Critical dimension metrology, Tolerancing, Performance modeling, Model-based design

PROCEEDINGS ARTICLE | October 20, 2006
Proc. SPIE. 6349, Photomask Technology 2006
KEYWORDS: Lithography, Optical lithography, Silicon, Photomasks, Optical proximity correction, SRAF, Picosecond phenomena, Semiconducting wafers, Model-based design, Resolution enhancement technologies

PROCEEDINGS ARTICLE | March 17, 2006
Proc. SPIE. 6156, Design and Process Integration for Microelectronic Manufacturing IV
KEYWORDS: Lithography, Logic, Lithographic illumination, Metals, Printing, Photomasks, Logic devices, Optical proximity correction, SRAF, Fiber optic illuminators

PROCEEDINGS ARTICLE | March 14, 2006
Proc. SPIE. 6156, Design and Process Integration for Microelectronic Manufacturing IV
KEYWORDS: Lithography, Reticles, Metals, Design for manufacturing, Optical proximity correction, Optimization (mathematics), Semiconducting wafers, Model-based design, Process modeling, Resolution enhancement technologies

Showing 5 of 11 publications
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