Dr. Mark I. Wagner
Senior Research Scientist at Micell Technologies Inc
SPIE Involvement:
Author
Publications (5)

PROCEEDINGS ARTICLE | March 23, 2007
Proc. SPIE. 6519, Advances in Resist Materials and Processing Technology XXIV
KEYWORDS: Carbon dioxide, Crystals, Coating, Atomic force microscopy, Photoresist materials, Head-mounted displays, Semiconducting wafers, Adhesives, Photoresist developing, Standards development

PROCEEDINGS ARTICLE | April 11, 2006
Proc. SPIE. 6153, Advances in Resist Technology and Processing XXIII
KEYWORDS: Image processing, Chemistry, Photoresist materials, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Photoresist processing, Semiconducting wafers, Photoresist developing, Standards development

PROCEEDINGS ARTICLE | April 11, 2006
Proc. SPIE. 6153, Advances in Resist Technology and Processing XXIII
KEYWORDS: Quartz, Polymers, Crystals, Photoresist materials, Extreme ultraviolet, Extreme ultraviolet lithography, Photoresist processing, Semiconducting wafers, Photoresist developing, Standards development

PROCEEDINGS ARTICLE | April 11, 2006
Proc. SPIE. 6153, Advances in Resist Technology and Processing XXIII
KEYWORDS: Carbon dioxide, Statistical analysis, Diffractive optical elements, Photoresist materials, Extreme ultraviolet, Line width roughness, Line edge roughness, Photoresist developing, Standards development, Temperature metrology

PROCEEDINGS ARTICLE | April 11, 2006
Proc. SPIE. 6153, Advances in Resist Technology and Processing XXIII
KEYWORDS: Image processing, Image analysis, Scanning electron microscopy, Software development, Extreme ultraviolet, Line width roughness, Critical dimension metrology, Line edge roughness, Semiconducting wafers, Standards development

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