Oxide mediated epitaxy and related techniques have shown promise as candidates for the production of high quality epitaxial CoSi2 on Si(001). The mechanisms governing the success of these techniques are still not clear, however. We present microstructural observations of the formation of CoSi2 on both the clean and oxidized Si(001) surface. Our observations were made using a UHV transmission electron microscope with in-situ MBE capability.
SC269: Workshop on Applications of Electron Microscopy and Surface Analytical Techniques in Microelectronics
This course will provide attendees with a basic working knowledge of the applications of electron microscopy and surface analytical techniques in microelectronics. The course will focus on techniques currently available to industrial customers. It will highlight the kind of information that may be obtained from each technique, and its useful application in the microelectronics industry. While the course will be specifically tailored for the microelectronics industry, it will also be useful to anyone interested in developing a working knowledge of the kind of information that electron microscopy and surface analytical techniques can deliver.