Mark E. Yelverton
SPIE Involvement:
Publications (6)

Proceedings Article | 2 April 2014 Paper
Young Ki Kim, Mark Yelverton, John Tristan, Joungchel Lee, Karsten Gutjahr, Ching-Hsiang Hsu, Hong Wei, Lester Wang, Chen Li, Lokesh Subramany, Woong Jae Chung, Jeong Soo Kim, Vidya Ramanathan, LipKong Yap, Jie Gao, Ram Karur-Shanmugam, Anna Golotsvan, Pedro Herrera, Kevin Huang, Bill Pierson
Proceedings Volume 9050, 90501Y (2014)
KEYWORDS: Semiconducting wafers, Etching, Lithography, Finite element methods, Scatterometry, Critical dimension metrology, Factory automation, Scanners, High volume manufacturing, Scatter measurement

Proceedings Article | 2 April 2014 Paper
Woong Jae Chung, John Tristan, Karsten Gutjahr, Lokesh Subramany, Chen Li, Yulei Sun, Mark Yelverton, Young Ki Kim, Jeong Soo Kim, Chin-Chou Kevin Huang, William Pierson, Ramkumar Karur-Shanmugam, Brent Riggs, Sven Jug, John Robinson, Lipkong Yap, Vidya Ramanathan
Proceedings Volume 9050, 90501P (2014)
KEYWORDS: Scanners, Semiconducting wafers, Overlay metrology, Control systems, Statistical modeling, Error analysis, Data modeling, Optical lithography, Process control, Atomic force microscopy

Proceedings Article | 2 April 2014 Paper
Proceedings Volume 9050, 90500Q (2014)
KEYWORDS: Lithography, Control systems, Semiconducting wafers, Metrology, Process control, Manufacturing, Databases, Algorithm development, Statistical analysis, Semiconductor manufacturing

Proceedings Article | 18 April 2013 Paper
Proceedings Volume 8681, 868110 (2013)
KEYWORDS: Semiconducting wafers, Optical alignment, Distortion, Overlay metrology, Annealing, Transistors, Logic, Laser processing, Lithography, Semiconductor manufacturing

Proceedings Article | 10 April 2013 Paper
Young Ki Kim, Mark Yelverton, Joungchel Lee, Jerry Cheng, Hong Wei, Jeong Soo Kim, Karsten Gutjahr, Jie Gao, Ram Karur-Shanmugam, Pedro Herrera, Kevin Huang, Roie Volkovich, Bill Pierson
Proceedings Volume 8681, 86811P (2013)
KEYWORDS: Semiconducting wafers, Finite element methods, Lithography, Scatterometry, Critical dimension metrology, Scanners, Factory automation, Scatter measurement, Metrology, Process control

Showing 5 of 6 publications
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