Mark A. van de Kerkhof
Product System Engineer at ASML Netherlands BV
SPIE Involvement:
Author
Publications (25)

SPIE Journal Paper | September 17, 2018
JM3 Vol. 17 Issue 04
KEYWORDS: Photomasks, Semiconducting wafers, Reticles, Extreme ultraviolet, Stochastic processes, Lithography, Printing, Pellicles, Scanning electron microscopy, Extreme ultraviolet lithography

PROCEEDINGS ARTICLE | March 19, 2018
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Lithography, Reticles, Scanners, Manufacturing, Pellicles, Projection systems, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, Fiber optic illuminators

PROCEEDINGS ARTICLE | March 19, 2018
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Lithography, Reticles, Inspection, Scanning electron microscopy, Pellicles, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, Stochastic processes

PROCEEDINGS ARTICLE | March 19, 2018
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Scattering, Scanners, Diffusers, Extreme ultraviolet, Extreme ultraviolet lithography, Molybdenum

PROCEEDINGS ARTICLE | October 16, 2017
Proc. SPIE. 10450, International Conference on Extreme Ultraviolet Lithography 2017

PROCEEDINGS ARTICLE | October 16, 2017
Proc. SPIE. 10450, International Conference on Extreme Ultraviolet Lithography 2017
KEYWORDS: Lithography, Optical design, Optical lithography, Lithographic illumination, Imaging systems, Scanners, Image resolution, Projection systems, Extreme ultraviolet, Extreme ultraviolet lithography

Showing 5 of 25 publications
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