Dr. Markos Trikeriotis
at Cornell Univ
SPIE Involvement:
Author
Publications (7)

PROCEEDINGS ARTICLE | April 1, 2013
Proc. SPIE. 8679, Extreme Ultraviolet (EUV) Lithography IV
KEYWORDS: Oxides, Carbon, Electron beam lithography, Optical lithography, Nanoparticles, Spectroscopy, Ions, Photoresist materials, Extreme ultraviolet lithography, Photoresist developing

PROCEEDINGS ARTICLE | March 23, 2012
Proc. SPIE. 8322, Extreme Ultraviolet (EUV) Lithography III
KEYWORDS: Oxides, Lithography, Nanoparticles, Crystals, Magnetism, Bioalcohols, Solids, Extreme ultraviolet, Sodium, Hafnium

PROCEEDINGS ARTICLE | March 23, 2012
Proc. SPIE. 8322, Extreme Ultraviolet (EUV) Lithography III
KEYWORDS: Electron beam lithography, Nanoparticles, Etching, Resistance, Photoresist materials, Extreme ultraviolet, Absorbance, Extreme ultraviolet lithography, Line edge roughness, Hafnium

PROCEEDINGS ARTICLE | April 16, 2011
Proc. SPIE. 7972, Advances in Resist Materials and Processing Technology XXVIII
KEYWORDS: Oxides, Lithography, Electron beam lithography, Refractive index, Nanoparticles, Etching, Resistance, Photoresist materials, Extreme ultraviolet lithography, Hafnium

PROCEEDINGS ARTICLE | March 26, 2010
Proc. SPIE. 7639, Advances in Resist Materials and Processing Technology XXVII
KEYWORDS: Oxides, Electron beam lithography, Refractive index, Deep ultraviolet, Nanoparticles, Etching, Resistance, Photoresist materials, Hafnium, Photoresist developing

PROCEEDINGS ARTICLE | April 1, 2009
Proc. SPIE. 7273, Advances in Resist Materials and Processing Technology XXVI
KEYWORDS: Lithography, Refractive index, Nanoparticles, Water, Ultraviolet radiation, Photoresist materials, Immersion lithography, Nanocomposites, Semiconducting wafers, Absorption

Showing 5 of 7 publications
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