Prof. Markus Bär
Head of Dept 8.4 at Physikalisch-Technische Bundesanstalt
SPIE Involvement:
Conference Program Committee | Author
Publications (13)

SPIE Journal Paper | 5 May 2020
JM3 Vol. 19 Issue 02
KEYWORDS: Photomasks, Scatterometry, Lithography, Chaos, Inverse problems, Stochastic processes, Bayesian inference, Silicon, Error analysis, Oxides

Proceedings Article | 21 June 2019 Presentation + Paper
Proc. SPIE. 11057, Modeling Aspects in Optical Metrology VII
KEYWORDS: Oxides, Data modeling, Polarization, Silicon, Scatterometry, Inverse problems, Photomasks, Scatter measurement, Systems modeling, Chaos

Proceedings Article | 21 June 2015 Paper
Proc. SPIE. 9526, Modeling Aspects in Optical Metrology V
KEYWORDS: Metrology, Atomic force microscopy, Scatterometry, Inverse problems, Finite element methods, Photomasks, Scatter measurement, Inverse optics, Chaos, Bayesian inference

Proceedings Article | 13 May 2013 Paper
Proc. SPIE. 8789, Modeling Aspects in Optical Metrology IV
KEYWORDS: Mathematical modeling, Diffraction, Deep ultraviolet, Numerical simulations, Scatterometry, Finite element methods, Photomasks, Extreme ultraviolet, Line width roughness, Line edge roughness

Proceedings Article | 13 May 2013 Paper
Proc. SPIE. 8789, Modeling Aspects in Optical Metrology IV
KEYWORDS: Mathematical modeling, Data modeling, Scatterometry, Monte Carlo methods, Inverse problems, Photomasks, Extreme ultraviolet, Scatter measurement, Statistical modeling, Inverse optics

Showing 5 of 13 publications
Conference Committee Involvement (8)
Modeling Aspects in Optical Metrology VIII
21 June 2021 | Online Only, Germany
Modeling Aspects in Optical Metrology VII
24 June 2019 | Munich, Germany
Modeling Aspects in Optical Metrology
26 June 2017 | Munich, Germany
Modeling Aspects in Optical Metrology V
23 June 2015 | Munich, Germany
Modeling Aspects in Optical Metrology IV
13 May 2013 | Munich, Germany
Showing 5 of 8 Conference Committees
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