Dr. Markus Bauer
at Carl Zeiss SMT GmbH
SPIE Involvement:
Author
Publications (5)

SPIE Journal Paper | 1 October 2020
JM3 Vol. 19 Issue 04

Proceedings Article | 24 March 2020 Presentation
Proc. SPIE. 11323, Extreme Ultraviolet (EUV) Lithography XI
KEYWORDS: Lithography, Refractive index, Lithographic illumination, Imaging systems, Reflectivity, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Nanoimprint lithography, Tantalum

Proceedings Article | 23 October 2018 Presentation + Paper
Proc. SPIE. 10810, Photomask Technology 2018
KEYWORDS: Lithography, Metrology, Image processing, Reflectivity, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, High volume manufacturing, 3D image processing, 193nm lithography

SPIE Journal Paper | 11 August 2018
JM3 Vol. 18 Issue 01
KEYWORDS: Photomasks, Nanoimprint lithography, Extreme ultraviolet, Phase shifts, Refractive index, Nickel, Ruthenium, Lithography, Reflectivity, Binary data

Proceedings Article | 19 March 2018 Presentation + Paper
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Thin films, Lithography, Refractive index, Nickel, Reflectivity, Photomasks, Extreme ultraviolet, Ruthenium, Phase shifts

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