Dr. Markus Bender
at Advanced Mask Technology Center
SPIE Involvement:
Conference Program Committee | Author
Publications (8)

PROCEEDINGS ARTICLE | August 2, 2018
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Metrology, Etching, Atomic force microscopy, Transmission electron microscopy, Signal processing, Photomasks, Extreme ultraviolet, Semiconducting wafers

PROCEEDINGS ARTICLE | July 13, 2017
Proc. SPIE. 10454, Photomask Japan 2017: XXIV Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Lithography, Mirrors, Etching, Manufacturing, Photomasks, Extreme ultraviolet, Critical dimension metrology, Optics manufacturing, Ruthenium, EUV optics

PROCEEDINGS ARTICLE | May 10, 2016
Proc. SPIE. 9984, Photomask Japan 2016: XXIII Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Etching, Quartz, Manufacturing, Reflectivity, Photomasks, Extreme ultraviolet, Optics manufacturing, Ruthenium, Mask cleaning, EUV optics

PROCEEDINGS ARTICLE | July 9, 2015
Proc. SPIE. 9658, Photomask Japan 2015: Photomask and Next-Generation Lithography Mask Technology XXII
KEYWORDS: Mirrors, Etching, Ions, Manufacturing, Reflectivity, Photomasks, Extreme ultraviolet, Optics manufacturing, Ruthenium, EUV optics

PROCEEDINGS ARTICLE | April 17, 2012
Proc. SPIE. 8352, 28th European Mask and Lithography Conference
KEYWORDS: Mirrors, Defect detection, Inspection, Reflectivity, Scanning electron microscopy, Optical inspection, Photomasks, Extreme ultraviolet, Semiconducting wafers, Defect inspection

PROCEEDINGS ARTICLE | April 2, 2007
Proc. SPIE. 6519, Advances in Resist Materials and Processing Technology XXIV
KEYWORDS: Lithography, Image processing, Image resolution, Extreme ultraviolet, Extreme ultraviolet lithography, Line edge roughness, Photoresist processing, EUV optics, 193nm lithography, Chemically amplified resists

Showing 5 of 8 publications
Conference Committee Involvement (7)
Extreme Ultraviolet (EUV) Lithography IX
26 February 2018 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography VIII
27 February 2017 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography VII
22 February 2016 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography VI
23 February 2015 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography V
24 February 2014 | San Jose, California, United States
Showing 5 of 7 published special sections
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