Dr. Markus Bender
I&R&D Projects at Advanced Mask Technology Ctr GmbH Co KG
SPIE Involvement:
Conference Program Committee | Author
Publications (11)

Proceedings Article | 27 June 2019
Proc. SPIE. 11178, Photomask Japan 2019: XXVI Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Scanners, Reflectivity, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Ruthenium, Oxidation

Proceedings Article | 1 May 2019
Proc. SPIE. 10957, Extreme Ultraviolet (EUV) Lithography X
KEYWORDS: Diffraction, Refractive index, Reticles, Etching, Scanners, Distortion, Photomasks, Extreme ultraviolet lithography, Tantalum, Absorption

Proceedings Article | 26 March 2019
Proc. SPIE. 10957, Extreme Ultraviolet (EUV) Lithography X
KEYWORDS: Electron beam lithography, Reticles, Metrology, Photomasks, Extreme ultraviolet

Proceedings Article | 2 August 2018
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Metrology, Etching, Atomic force microscopy, Transmission electron microscopy, Signal processing, Photomasks, Extreme ultraviolet, Semiconducting wafers

Proceedings Article | 13 July 2017
Proc. SPIE. 10454, Photomask Japan 2017: XXIV Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Lithography, Mirrors, Etching, Manufacturing, Photomasks, Extreme ultraviolet, Critical dimension metrology, Optics manufacturing, Ruthenium, EUV optics

Showing 5 of 11 publications
Conference Committee Involvement (7)
Extreme Ultraviolet (EUV) Lithography IX
26 February 2018 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography VIII
27 February 2017 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography VII
22 February 2016 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography VI
23 February 2015 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography V
24 February 2014 | San Jose, California, United States
Showing 5 of 7 Conference Committees
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