Dr. Markus Brink
at IBM Thomas J Watson Research Ctr
SPIE Involvement:
Author
Publications (5)

SPIE Journal Paper | February 7, 2017
JM3 Vol. 16 Issue 01
KEYWORDS: Directed self assembly, Resolution enhancement technologies, Lithography, Metals, Optical lithography, Fin field effect transitor, Photomasks, 3D modeling, Computational lithography, Optical proximity correction

PROCEEDINGS ARTICLE | March 19, 2015
Proc. SPIE. 9423, Alternative Lithographic Technologies VII
KEYWORDS: Optical lithography, Polymethylmethacrylate, Etching, Polymers, Silicon, Photomasks, Directed self assembly, Line edge roughness, Tolerancing, Fin field effect transitor

PROCEEDINGS ARTICLE | March 19, 2015
Proc. SPIE. 9423, Alternative Lithographic Technologies VII
KEYWORDS: Electron beam lithography, Polymethylmethacrylate, Etching, Image segmentation, Composites, Scanning electron microscopy, Photomasks, Directed self assembly, Picosecond phenomena, System on a chip

PROCEEDINGS ARTICLE | March 17, 2012
Proc. SPIE. 8328, Advanced Etch Technology for Nanopatterning
KEYWORDS: Oxides, Lithography, Optical lithography, Polymethylmethacrylate, Etching, Polymers, Silicon, Line edge roughness, Vacuum ultraviolet, Plasma

PROCEEDINGS ARTICLE | April 16, 2011
Proc. SPIE. 7972, Advances in Resist Materials and Processing Technology XXVIII
KEYWORDS: Oxides, Electron beam lithography, Etching, Ions, Silicon, Gases, Hydrogen, Plasma etching, Reactive ion etching, Plasma

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