Dr. Markus Waiblinger
Senior Product Manager at Carl Zeiss SMT GmbH
SPIE Involvement:
Author
Publications (13)

Proceedings Article | 23 October 2015
Proc. SPIE. 9635, Photomask Technology 2015
KEYWORDS: Electron beams, Etching, Quartz, Particles, Molecules, Electrons, Ions, Chemistry, Photomasks, Extreme ultraviolet

SPIE Journal Paper | 27 October 2014
JM3 Vol. 13 Issue 04
KEYWORDS: Photomasks, Extreme ultraviolet, Inspection, Scanners, Extreme ultraviolet lithography, Scanning electron microscopy, Lithography, Deep ultraviolet, Atomic force microscopy, Manufacturing

Proceedings Article | 17 October 2014
Proc. SPIE. 9235, Photomask Technology 2014
KEYWORDS: Electron beams, Etching, Quartz, Molecules, Ions, Chemistry, Image resolution, Ion beams, Photomasks, Extreme ultraviolet

Proceedings Article | 8 November 2012
Proc. SPIE. 8522, Photomask Technology 2012
KEYWORDS: Mirrors, Reticles, Inspection, Distortion, Atomic force microscopy, Scanning electron microscopy, Printing, Photomasks, Extreme ultraviolet, Semiconducting wafers

Proceedings Article | 30 June 2012
Proc. SPIE. 8441, Photomask and Next-Generation Lithography Mask Technology XIX
KEYWORDS: Mirrors, Reticles, Inspection, Distortion, Atomic force microscopy, Scanning electron microscopy, Printing, Photomasks, Extreme ultraviolet, Semiconducting wafers

Showing 5 of 13 publications
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