Marshal A. Miller
at Panoramic Technology Inc
SPIE Involvement:
Author
Publications (11)

SPIE Journal Paper | 19 July 2016
JM3 Vol. 15 Issue 03
KEYWORDS: Optical proximity correction, Data modeling, Critical dimension metrology, Optical calibration, Scanning electron microscopy, Hybrid optics, Metals, Calibration, Instrument modeling, OLE for process control

Proceedings Article | 31 March 2015 Paper
Proc. SPIE. 9426, Optical Microlithography XXVIII
KEYWORDS: Optical lithography, Data modeling, Calibration, Scanning electron microscopy, Finite element methods, Cadmium sulfide, Optical proximity correction, Semiconducting wafers, Statistical modeling, Front end of line

Proceedings Article | 31 March 2014 Paper
Proc. SPIE. 9052, Optical Microlithography XXVII
KEYWORDS: Metrology, Data modeling, Calibration, Metals, Scanning electron microscopy, Logic devices, Optical proximity correction, Critical dimension metrology, OLE for process control, Instrument modeling

Proceedings Article | 19 May 2011 Paper
Proc. SPIE. 8081, Photomask and Next-Generation Lithography Mask Technology XVIII
KEYWORDS: Lithography, Reticles, Image processing, Inspection, Design for manufacturing, Photomasks, Double patterning technology, Line edge roughness, Algorithm development, Device simulation

Proceedings Article | 10 March 2010 Paper
Proc. SPIE. 7640, Optical Microlithography XXIII
KEYWORDS: Lithography, Monochromatic aberrations, Detection and tracking algorithms, Polarization, Calibration, Composites, Photomasks, Convolution, Electromagnetism, Binary data

Showing 5 of 11 publications
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