Martha I. Sanchez
Materials Metrology Manager at Start-up in stealth mode
SPIE Involvement:
Conference Program Committee | Editorial Board Member: Journal of Micro/Nanolithography, MEMS, and MOEMS | Editorial Board Member: Journal of Micro/Nanopatterning, Materials, and Metrology | Author | Editor
Publications (37)

SPIE Journal Paper | 2 March 2021
JM3 Vol. 20 Issue 01

Proceedings Article | 26 September 2019 Paper
Proc. SPIE. 11147, International Conference on Extreme Ultraviolet Lithography 2019
KEYWORDS: Lithography, Polymers, Molecules, Printing, Photoresist materials, Extreme ultraviolet, Extreme ultraviolet lithography, Photoresist processing, Stochastic processes, Polymer thin films

Proceedings Article | 25 March 2019 Presentation
Proc. SPIE. 10960, Advances in Patterning Materials and Processes XXXVI
KEYWORDS: Semiconductors, Metals, Electrons, Photoresist materials, Extreme ultraviolet, Semiconductor manufacturing, Extreme ultraviolet lithography, High volume manufacturing, Photoresist processing, Systems modeling

Proceedings Article | 25 March 2019 Presentation
Proc. SPIE. 10960, Advances in Patterning Materials and Processes XXXVI
KEYWORDS: Semiconductors, Metals, Manufacturing, Photoresist materials, Extreme ultraviolet, Semiconductor manufacturing, Extreme ultraviolet lithography, Photochemistry, Thermal modeling, Resolution enhancement technologies

SPIE Journal Paper | 1 October 2018
JM3 Vol. 17 Issue 03
KEYWORDS: Optical lithography, 3D displays, 3D acquisition, Directed self assembly, Nanoimprint lithography, Microopto electromechanical systems, Packaging, Semiconductors, Nanostructures, Light emitting diodes

Showing 5 of 37 publications
Proceedings Volume Editor (7)

Showing 5 of 7 publications
Conference Committee Involvement (21)
Novel Patterning Technologies 2022
27 February 2022 | San Jose, California, United States
Novel Patterning Technologies 2021
22 February 2021 | Online Only, California, United States
Novel Patterning Technologies for Semiconductors, MEMS/NEMS and MOEMS 2020
24 February 2020 | San Jose, California, United States
Novel Patterning Technologies for Semiconductors, MEMS/NEMS and MOEMS 2019
25 February 2019 | San Jose, California, United States
Metrology, Inspection, and Process Control for Microlithography XXXIII
25 February 2019 | San Jose, California, United States
Showing 5 of 21 Conference Committees
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