Mr. Martijn H.A. Leenders Profile

Martijn H.A. Leenders

Fellow at ASML Netherlands BV

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Author

Publications (7)

Proceedings Article | 22 September 2020 Presentation

0.33 NA EUV systems for High Volume Manufacturing

Eric Verhoeven, Ron Schuurhuis, Marcel Mastenbroek, Peter Jonkers, Frank Bornebroek, Arthur Minnaert, Harrie van Dijck, Parham Yaghoobi, Geert Fisser, Payam Tayebati, Martijn Leenders, Roderik van Es

Proceedings Volume 11517, 1151703 (2020) https://doi.org/10.1117/12.2572356

KEYWORDS: High volume manufacturing, Extreme ultraviolet, Logic devices, Manufacturing, Scanners, Lithography, Logic, Overlay metrology, Critical dimension metrology, Stochastic processes

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Proceedings Article | 9 September 2019 Presentation

Laser-produced plasma incoherent EUV light sources for high-volume manufacturing semiconductor lithography (Conference Presentation)

Michael Purvis, Igor Fomenkov, Alexander Schafgans, Peter Mayer, Klaus Hummler, Martijn Leenders, Yezheng Tao, Slava Rokitski, Jayson Stewart, Alex Ershov, Robert Rafac, Silvia De Dea, Georgiy Vaschenko, David Brandt, Daniel Brown

Proceedings Volume 11111, 111110K (2019) https://doi.org/10.1117/12.2534691

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Proceedings Article | 12 April 2013 Paper

Extending immersion lithography down to 1x nm production nodes

Wim de Boeij, Remi Pieternella, Igor Bouchoms, Martijn Leenders, Marjan Hoofman, Roelof de Graaf, Haico Kok, Par Broman, Joost Smits, Jan-Jaap Kuit, Matthew McLaren

Proceedings Volume 8683, 86831L (2013) https://doi.org/10.1117/12.2021397

KEYWORDS: Reticles, Scanners, Semiconducting wafers, HVAC controls, Overlay metrology, Calibration, Sensors, Metrology, Distortion, Optical lithography

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Proceedings Article | 13 March 2012 Paper

Extending 1.35 NA immersion lithography down to 1x nm production nodes

Igor Bouchoms, Martijn Leenders, Jan Jaap Kuit, Robert Kazinczi, Roelof de Graaf, Bart Paarhuis, Pieter Gunter, Stefan Weichselbaum, Marcel Beems, Martin Verhoeven, Rob van Ballegoij

Proceedings Volume 8326, 83260L (2012) https://doi.org/10.1117/12.915807

KEYWORDS: Semiconducting wafers, Reticles, Sensors, Scanners, Control systems, Optical alignment, HVAC controls, Wavefronts, Process control, Lithography

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Proceedings Article | 7 March 2008 Paper

Latest developments on immersion exposure systems

Jan Mulkens, Jos de Klerk, Martijn Leenders, Fred de Jong, Jan Cromwijk

Proceedings Volume 6924, 69241P (2008) https://doi.org/10.1117/12.774958

KEYWORDS: Semiconducting wafers, Double patterning technology, Overlay metrology, Focus stacking software, Lithography, Manufacturing, Monochromatic aberrations, Polarization, Immersion lithography, Combined lens-mirror systems

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Proceedings Article | 19 March 2007 Paper

Defects, overlay, and focus performance improvements with five generations of immersion exposure systems

Jan Mulkens, Bob Streefkerk, Hans Jasper, Jos de Klerk, Fred de Jong, Leon Levasier, Martijn Leenders

Proceedings Volume 6520, 652005 (2007) https://doi.org/10.1117/12.713577

KEYWORDS: Semiconducting wafers, Particles, Signal attenuation, Scanners, Bridges, Thin film coatings, Molecular bridges, Photoresist processing, Control systems, Curtains

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Proceedings Article | 15 March 2006 Paper

A dive into clear water: immersion defect capabilities

B. Streefkerk, J. Mulkens, R. Moerman, M. Stavenga, J. van der Hoeven, C. Grouwstra, R. Bruls, M. Leenders, S. Wang, Y. van Dommelen, M. Boerema, H. Jansen, K. Cummings, M. Riepen, H. Boom, M. Suddendorf, P. Huisman

Proceedings Volume 6154, 61540S (2006) https://doi.org/10.1117/12.660376

KEYWORDS: Particles, Thin film coatings, Semiconducting wafers, Scanners, Curtains, Photoresist processing, Scanning electron microscopy, Immersion lithography, Lithography, Manufacturing

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Showing 5 of 7 publications

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