Martijn H.A. Leenders
Fellow at ASML Netherlands BV
SPIE Involvement:
Author
Publications (6)

Proceedings Article | 9 September 2019
Proc. SPIE. 11111, X-Ray Lasers and Coherent X-Ray Sources: Development and Applications XIII

Proceedings Article | 12 April 2013
Proc. SPIE. 8683, Optical Microlithography XXVI
KEYWORDS: Reticles, Scanners, Semiconducting wafers, HVAC controls, Overlay metrology, Calibration, Sensors, Metrology, Distortion, Optical lithography

Proceedings Article | 13 March 2012
Proc. SPIE. 8326, Optical Microlithography XXV
KEYWORDS: Semiconducting wafers, Reticles, Sensors, Scanners, Control systems, Optical alignment, HVAC controls, Wavefronts, Process control, Lithography

Proceedings Article | 7 March 2008
Proc. SPIE. 6924, Optical Microlithography XXI
KEYWORDS: Semiconducting wafers, Double patterning technology, Overlay metrology, Focus stacking software, Lithography, Manufacturing, Monochromatic aberrations, Polarization, Immersion lithography, Combined lens-mirror systems

Proceedings Article | 19 March 2007
Proc. SPIE. 6520, Optical Microlithography XX
KEYWORDS: Semiconducting wafers, Particles, Signal attenuation, Scanners, Bridges, Thin film coatings, Molecular bridges, Photoresist processing, Control systems, Curtains

Showing 5 of 6 publications
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